APPLICATION OF RESONANT IONIZATION MASS-SPECTROSCOPY TO DEPTH PROFILING IN III-V SEMICONDUCTOR-DEVICES

被引：0
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作者：
MCLEAN, CJ
MARSH, JH
CAHILL, JW
DRYSDALE, SLT
JENNINGS, R
MCCOMBES, PT
LAND, AP
LEDINGHAM, KWD
SINGHAL, RP
SMYTH, MHC
STEWART, DT
TOWRIE, M
机构：
来源：
RESONANCE IONIZATION SPECTROSCOPY 1988 | 1989年 / 94卷
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中图分类号：
O65 [分析化学];
学科分类号：
070302 ; 081704 ;
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页码：193 / 196
页数：4
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