A PULSED PLASMA X-RAY SOURCE FOR X-RAY-LITHOGRAPHY

被引：0

作者：

MATTHEWS, S ^{[1
]}

DAHLBACKA, G ^{[1
]}

STRINGFIELD, R ^{[1
]}

COOPER, R ^{[1
]}

SZE, H ^{[1
]}

机构：

[1] PHYS INT CO,SAN LEANDRO,CA 94577

来源：

关键词：

D O I：

暂无

中图分类号：

O646 [电化学、电解、磁化学];

学科分类号：

081704 ;

摘要：

引用

页码：C112 / C113

页数：2

共 50 条

[31] TRENDS IN X-RAY-LITHOGRAPHY
MALDONADO, JR
PROCEEDINGS OF THE SOCIETY OF PHOTO-OPTICAL INSTRUMENTATION ENGINEERS, 1982, 333 : 131 - 135
[32] PROSPECTS FOR X-RAY-LITHOGRAPHY
FLEMING, D
MALDONADO, JR
NEISSER, M
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1992, 10 (06): : 2511 - 2515
[33] REVIEW OF X-RAY-LITHOGRAPHY
SMITH, HI
FLANDERS, DC
JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1980, 127 (03) : C102 - C102
[34] AN X-RAY-LITHOGRAPHY SYSTEM
BUCKLEY, WD
HUGHES, GP
JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1981, 128 (05) : 1106 - 1111
[35] CHIPS BY X-RAY-LITHOGRAPHY
WILSON, J
ELECTRONICS & WIRELESS WORLD, 1988, 94 (1633): : 1138 - 1138
[36] X-RAY-LITHOGRAPHY FOR VLSI
TRIPLETT, BB
HOLLMAN, RF
PROCEEDINGS OF THE IEEE, 1983, 71 (05) : 585 - 588
[37] RETHINKING X-RAY-LITHOGRAPHY
ZORPETTE, G
IEEE SPECTRUM, 1992, 29 (06) : 33 - 36
[38] X-RAY-LITHOGRAPHY FOR MICROFABRICATION
MAYDAN, D
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1980, 17 (05): : 1164 - 1168
[39] X-RAY-LITHOGRAPHY - PREFACE
WARLAUMONT, JM
IBM JOURNAL OF RESEARCH AND DEVELOPMENT, 1993, 37 (03) : 288 - 289
[40] THE MICROTRON IN X-RAY-LITHOGRAPHY
MILEIKOWSKY, C
NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 1987, 24-5 : 820 - 825