A PULSED PLASMA X-RAY SOURCE FOR X-RAY-LITHOGRAPHY

被引:0
|
作者
MATTHEWS, S [1 ]
DAHLBACKA, G [1 ]
STRINGFIELD, R [1 ]
COOPER, R [1 ]
SZE, H [1 ]
机构
[1] PHYS INT CO,SAN LEANDRO,CA 94577
关键词
D O I
暂无
中图分类号
O646 [电化学、电解、磁化学];
学科分类号
081704 ;
摘要
引用
收藏
页码:C112 / C113
页数:2
相关论文
共 50 条
  • [21] X-ray wavelength optimization of the laser plasma X-ray lithography source
    Chaker, M.
    Boily, S.
    Lafontaine, B.
    Kieffer, J.C.
    Pepin, H.
    Toubhans, I.
    Fabbro, R.
    Microelectronic Engineering, 1990, 10 (02) : 91 - 105
  • [22] ALUMINUM PLASMA X-RAY SOURCE FOR LITHOGRAPHY
    OKABE, M
    KITAMURA, Y
    FURUKAWA, Y
    JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1982, 129 (03) : C113 - C113
  • [23] X-RAY-LITHOGRAPHY USING A KRF LASER-PLASMA SOURCE
    ONEILL, F
    GOWER, MC
    TURCU, ICE
    OWADANO, Y
    APPLIED OPTICS, 1986, 25 (04): : 464 - 465
  • [24] CALIBRATION OF AN EXCIMER LASER-PLASMA SOURCE FOR X-RAY-LITHOGRAPHY
    TURCU, ICE
    MALDONADO, JR
    ROSS, IN
    SHIELD, H
    TRENDA, P
    BATANI, D
    FLUCK, P
    GOODSON, H
    MICROELECTRONIC ENGINEERING, 1994, 23 (1-4) : 207 - 210
  • [25] REPETITIVE PLASMA-FOCUS AS RADIATION SOURCE FOR X-RAY-LITHOGRAPHY
    RICHTER, F
    EBERLE, J
    HOLZ, R
    NEFF, W
    LEBERT, R
    DENSE Z-PINCHES, 1989, 195 : 515 - 521
  • [26] A LASER-GENERATED PLASMA SOURCE FOR X-RAY-LITHOGRAPHY AND VLSI
    MICHETTE, AG
    ROGOYSKI, AM
    BURGE, RE
    JOURNAL OF PHYSICS E-SCIENTIFIC INSTRUMENTS, 1988, 21 (10): : 959 - 965
  • [27] X-RAY-LITHOGRAPHY, FROM 500 TO 30 NM - X-RAY NANOLITHOGRAPHY
    SMITH, HI
    SCHATTENBURG, ML
    IBM JOURNAL OF RESEARCH AND DEVELOPMENT, 1993, 37 (03) : 319 - 329
  • [28] ULTRAVIOLET AND X-RAY-LITHOGRAPHY
    NAGEL, DJ
    PROCEEDINGS OF THE SOCIETY OF PHOTO-OPTICAL INSTRUMENTATION ENGINEERS, 1981, 279 : 98 - 110
  • [29] A powerful soft X-ray source for X-ray lithography based on plasma focusing
    Bogolyubov, EP
    Bochkov, VD
    Veretennikov, VA
    Vekhoreva, LT
    Gribkov, VA
    Dubrovskii, AV
    Ivanov, YP
    Isakov, AI
    Krokhin, ON
    Lee, P
    Lee, S
    Nikulin, VY
    Serban, A
    Silin, PV
    Feng, X
    Zhang, GX
    PHYSICA SCRIPTA, 1998, 57 (04): : 488 - 494
  • [30] X-RAY-LITHOGRAPHY TECHNOLOGY
    URAI, M
    IGUCHI, K
    SHIGA, C
    SHARP TECHNICAL JOURNAL, 1988, (39): : 79 - 82