PUMPING SPEED OF SPUTTER ION PUMPS

被引：5

作者：

AUDI, M

机构：

来源：

关键词：

D O I：

10.1016/0042-207X(88)90439-3

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

页码：669 / 671

页数：3

共 50 条

[31] SPUTTER-ION PUMPS WITH THERMIONIC ELECTRON INJECTION
HIRSCH, EH
JOURNAL OF SCIENTIFIC INSTRUMENTS, 1964, 41 (07): : 426 - &
[32] COMPARISON OF DIODE AND TRIODE SPUTTER-ION PUMPS
DENISON, DR
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1977, 14 (01): : 633 - 635
[33] USE OF TRIODE ION PUMPS FOR PUMPING DEUTERIUM
POST, RJ
NUCLEAR INSTRUMENTS & METHODS, 1968, 61 (01): : 108 - &
[34] PUMPING SPEED OF DIFFUSION PUMPS BELOW LIMITING PRESSURE
BERRY, CE
REVIEW OF SCIENTIFIC INSTRUMENTS, 1949, 20 (11): : 835 - 836
[35] TiN reactive sputter deposition studied as a function of the pumping speed
Heuvelman, WM
Helderman, P
Janssen, GCAM
Radelaar, S
THIN SOLID FILMS, 1998, 332 (1-2) : 335 - 339
[36] AR-PUMPING CHARACTERISTICS OF DIODE-TYPE SPUTTER ION PUMPS WITH VARIOUS SHAPES OF TA/TI CATHODE PAIRS
YOSHIMURA, N
OHARA, K
ANDO, I
HIRANO, H
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1992, 10 (03): : 553 - 555
[37] TRIGGERING SPUTTER ION PUMPS IN ULTRA-HIGH VACUUM
KOMIYA, S
SATO, H
HAYASHI, C
VACUUM, 1967, 17 (03) : 163 - &
[38] GAS EVOLUTION DURING BAKING OF SPUTTER-ION PUMPS
RIVIERE, JC
ALLINSON, JD
VACUUM, 1964, 14 (03) : 97 - &
[39] PERFORMANCE CHARACTERISTICS OF INDIGENOUSLY FABRICATED SPUTTER-ION PUMPS
GOPALARAMAN, CP
VIJENDRA.P
INDIAN JOURNAL OF TECHNOLOGY, 1970, 8 (04): : 150 - +
[40] ECONOMICAL POWERING OF A LARGE MULTIPLICITY OF SPUTTER-ION PUMPS
CARIDES, T
COTTINGHAM, JG
IEEE TRANSACTIONS ON NUCLEAR SCIENCE, 1967, NS14 (03) : 836 - +