CHANGES IN THE THERMAL-OXIDATION OF GALLIUM-ARSENIDE INDUCED BY ION-IMPLANTATION

被引:1
|
作者
BUTCHER, DN
SEALY, BJ
机构
关键词
D O I
10.1049/el:19790036
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
引用
收藏
页码:51 / 52
页数:2
相关论文
共 50 条
  • [21] SELECTIVE AREA ION-IMPLANTATION FOR GALLIUM-ARSENIDE MICROWAVE DEVICES AND CIRCUITS
    BARTLE, DC
    GRANGE, JD
    GEC JOURNAL OF RESEARCH, 1983, 1 (03): : 174 - 177
  • [22] N+ DOPING OF GALLIUM-ARSENIDE BY RAPID THERMAL-OXIDATION OF A SILICON CAP
    SADANA, DK
    DESOUZA, JP
    CARDONE, F
    APPLIED PHYSICS LETTERS, 1990, 57 (16) : 1681 - 1683
  • [23] THERMAL-OXIDATION KINETICS OF SILICON, USING ION-IMPLANTATION ANTIMONY
    UGAI, YA
    ANOKHIN, VZ
    LOBOVA, VA
    MITTOVA, IY
    MEDVEDEV, NM
    PASHKOVA, LI
    ZHURNAL FIZICHESKOI KHIMII, 1981, 55 (07): : 1873 - 1875
  • [25] GALLIUM-ARSENIDE TRANSFERRED-ELECTRON DEVICES BY LOW-LEVEL ION-IMPLANTATION
    ANDERSON, WT
    DIETRICH, HB
    SWIGGARD, EW
    LEE, SH
    BARK, ML
    JOURNAL OF APPLIED PHYSICS, 1980, 51 (06) : 3175 - 3177
  • [26] DAMAGE IN GALLIUM-ARSENIDE CRYSTALS PRODUCED BY ION-IMPLANTATION, ABRASION AND BALL-MILLING
    TUNKASIRI, T
    LEWIS, D
    JOURNAL OF MATERIALS SCIENCE, 1975, 10 (08) : 1367 - 1374
  • [27] IMPURITY GETTERING IN SEMI-INSULATING GALLIUM-ARSENIDE USING ION-IMPLANTATION DAMAGE
    BOZLER, CO
    DONNELLY, JP
    LINDLEY, WT
    REYNOLDS, RA
    APPLIED PHYSICS LETTERS, 1976, 29 (11) : 698 - 699
  • [28] GALLIUM-ARSENIDE SURFACE MODIFICATION BY LOW-ENERGY ARGON AND NITROGEN ION-IMPLANTATION
    WANG, YG
    ASHOK, S
    NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 1989, 39 (1-4): : 461 - 465
  • [29] USE OF ION-IMPLANTATION IN A COMPARISON OF THERMAL-OXIDATION OF TITANIUM AND ZIRCONIUM
    DEARNALEY, G
    BENJAMIN, JD
    MILLER, WS
    WEIDMAN, L
    CORROSION SCIENCE, 1976, 16 (10) : 717 - 728
  • [30] MONOLITHIC MICROWAVE-AMPLIFIERS FORMED BY ION-IMPLANTATION INTO LEC GALLIUM-ARSENIDE SUBSTRATES
    DRIVER, MC
    WANG, SK
    PRZYBYSZ, JX
    WRICK, VL
    WICKSTROM, RA
    COLEMAN, ES
    OAKES, JG
    IEEE TRANSACTIONS ON ELECTRON DEVICES, 1981, 28 (02) : 191 - 196