NIOBIUM OXIDE ELECTROCHROMIC THIN-FILMS PREPARED BY REACTIVE DC MAGNETRON SPUTTERING

被引：19

作者：

YOSHIMURA, K ^{[1
]}

MIKI, T ^{[1
]}

IWAMA, S ^{[1
]}

TANEMURA, S ^{[1
]}

机构：

[1] DAIDO INST TECHNOL, DEPT ELECTR ENGN, NAGOYA, AICHI 457, JAPAN

来源：

JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS & EXPRESS LETTERS | 1995年 / 34卷 / 10A期

关键词：

ELECTROCHROMISM; NB2O5; REACTIVE SPUTTERING; XRD; CYCLIC VOLTAMMETRY;

D O I：

10.1143/JJAP.34.L1293

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

Niobium oxide electrochromic thin films were prepared by reactive DC magnetron sputtering method. Electrochromic properties of prepared films strongly depended on the substrate temperature during sputtering. The sample with a substrate temperature of 500 degrees C was well crystallized and showed excellent electrochromism. Its integrated luminous transmittance could be controlled from 26% to 89%. Optical modulation range was small for samples with low substrate temperature and these samples showed fast degradation.

引用

页码：L1293 / L1296

页数：4

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