Electrochromic properties of niobium oxide thin films prepared by DC magnetron sputtering

被引：19
|
作者：
Yoshimura, K
Miki, T
Tanemura, S
机构：
[1] Natl. Indust. Res. Inst. of Nagoya, Nagoya
来源：
JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 1997年 / 144卷 / 09期
关键词：
D O I：
10.1149/1.1837947
中图分类号：
O646 [电化学、电解、磁化学];
学科分类号：
081704 ;
摘要：
Niobium oxide electrochromic thin films were prepared by reactive de magnetron sputtering and their electrochromic properties for Li intercalation and durability were studied. Chronoamperometric analyses revealed that the extended space-charge limited model by Zhang et al. is applicable to Nb2O5 films. Crystallized Nb2O5 films showed excellent electrochromism and stability over many coloration-bleaching cycles. The best performance was obtained for films with a substrate temperature of 500 degrees C and an oxygen flow rate of 10 sccm.
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收藏
页码：2982 / 2985
页数：4
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