Niobium oxide electrochromic thin films prepared by reactive DC magnetron sputtering

被引：0
|
作者：
Yoshimura, K. [1 ]
Miki, T. [1 ]
Iwama, S. [1 ]
Tanemura, S. [1 ]
机构：
[1] Natl Industrial Research Inst of, Nagoya, Nagoya, Japan
来源：
Japanese Journal of Applied Physics, Part 2: Letters | 1995年 / 34卷 / 10 A期
关键词：
D O I：
暂无
中图分类号：
学科分类号：
摘要：
引用
收藏
相关论文
共 50 条
  • [1] NIOBIUM OXIDE ELECTROCHROMIC THIN-FILMS PREPARED BY REACTIVE DC MAGNETRON SPUTTERING
    YOSHIMURA, K
    MIKI, T
    IWAMA, S
    TANEMURA, S
    [J]. JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS & EXPRESS LETTERS, 1995, 34 (10A): : L1293 - L1296
  • [2] Characterization of niobium oxide electrochromic thin films prepared by reactive dc magnetron sputtering
    Yoshimura, K
    Miki, T
    Iwama, S
    Tanemura, S
    [J]. THIN SOLID FILMS, 1996, 281 : 235 - 238
  • [3] Electrochromic properties of niobium oxide thin films prepared by DC magnetron sputtering
    Yoshimura, K
    Miki, T
    Tanemura, S
    [J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1997, 144 (09) : 2982 - 2985
  • [4] Nickel oxide electrochromic thin films prepared by reactive DC magnetron sputtering
    Yoshimura, Kazuki
    Miki, Takeshi
    Tanemura, Sakae
    [J]. Japanese Journal of Applied Physics, Part 1: Regular Papers & Short Notes & Review Papers, 1995, 34 (5 A): : 2440 - 2446
  • [5] Characterization of niobium oxide films prepared by reactive DC magnetron sputtering
    Venkataraj, S
    Drese, R
    Kappertz, O
    Jayavel, R
    Wuttig, M
    [J]. PHYSICA STATUS SOLIDI A-APPLICATIONS AND MATERIALS SCIENCE, 2001, 188 (03): : 1047 - 1058
  • [6] NICKEL-OXIDE ELECTROCHROMIC THIN-FILMS PREPARED BY REACTIVE DC MAGNETRON SPUTTERING
    YOSHIMURA, K
    MIKI, T
    TANEMURA, S
    [J]. JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS, 1995, 34 (5A): : 2440 - 2446
  • [7] Characterization of niobium oxide electrochromic thin films prepared by reactive d.c. magnetron sputtering
    Yoshimura, Kazuki
    Miki, Takeshi
    Iwama, Saburo
    Tanemura, Sakae
    [J]. Thin Solid Films, 1996, 281-282 (1-2): : 235 - 238
  • [8] ELECTROCHROMIC PROPERTIES OF NIOBIUM OXIDE THIN-FILMS PREPARED BY RADIOFREQUENCY MAGNETRON SPUTTERING METHOD
    MARUYAMA, T
    ARAI, S
    [J]. APPLIED PHYSICS LETTERS, 1993, 63 (07) : 869 - 870
  • [9] Electrochromic properties of InON thin films prepared by DC magnetron sputtering
    Jiahao Chen
    Xuemei Ji
    Jiangbin Su
    Zuming He
    Bin Tang
    [J]. Applied Physics A, 2024, 130
  • [10] Electrochromic properties of InON thin films prepared by DC magnetron sputtering
    Chen, Jiahao
    Ji, Xuemei
    Su, Jiangbin
    He, Zuming
    Tang, Bin
    [J]. APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING, 2024, 130 (03):
12345