SIMULATION OF TEMPERATURE EFFECTS DURING RAPID THERMAL-PROCESSING

被引：11

|

作者：

KAKOSCHKE, R

BUSSMANN, E

机构：

来源：

RAPID THERMAL ANNEALING / CHEMICAL VAPOR DEPOSITION AND INTEGRATED PROCESSING | 1989年 / 146卷

关键词：

D O I：

10.1557/PROC-146-473

中图分类号：

O646 [电化学、电解、磁化学];

学科分类号：

081704 ;

摘要：

引用

收藏

页码：473 / 482

页数：10

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