SIMULATION OF TEMPERATURE EFFECTS DURING RAPID THERMAL-PROCESSING

被引：11
|
作者：
KAKOSCHKE, R
BUSSMANN, E
机构：
来源：
RAPID THERMAL ANNEALING / CHEMICAL VAPOR DEPOSITION AND INTEGRATED PROCESSING | 1989年 / 146卷
关键词：
D O I：
10.1557/PROC-146-473
中图分类号：
O646 [电化学、电解、磁化学];
学科分类号：
081704 ;
摘要：
引用
收藏
页码：473 / 482
页数：10
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