MULTILAYER APPLICATION OF UV HARDENING - PULSED ELECTRON-BEAMS RESIST HARDENING IN SOFT VACUUM

被引：0
|
作者：
HIRAOKA, H
LEE, J
HINSBERG, W
KRISHNASWAMY, J
LI, L
COLLINS, G
机构：
[1] IBM CORP,ALMADEN RES CTR,SAN JOSE,CA 95120
[2] COLORADO STATE UNIV,DEPT ELECT ENGN,FT COLLINS,CO 80523
来源：
JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 1987年 / 134卷 / 8B期
关键词：
D O I：
暂无
中图分类号：
O646 [电化学、电解、磁化学];
学科分类号：
081704 ;
摘要：
引用
收藏
页码：C436 / C436
页数：1
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