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MULTILAYER APPLICATION OF UV HARDENING - PULSED ELECTRON-BEAMS RESIST HARDENING IN SOFT VACUUM
被引:0
|
作者
:
HIRAOKA, H
论文数:
0
引用数:
0
h-index:
0
机构:
IBM CORP,ALMADEN RES CTR,SAN JOSE,CA 95120
HIRAOKA, H
LEE, J
论文数:
0
引用数:
0
h-index:
0
机构:
IBM CORP,ALMADEN RES CTR,SAN JOSE,CA 95120
LEE, J
HINSBERG, W
论文数:
0
引用数:
0
h-index:
0
机构:
IBM CORP,ALMADEN RES CTR,SAN JOSE,CA 95120
HINSBERG, W
KRISHNASWAMY, J
论文数:
0
引用数:
0
h-index:
0
机构:
IBM CORP,ALMADEN RES CTR,SAN JOSE,CA 95120
KRISHNASWAMY, J
LI, L
论文数:
0
引用数:
0
h-index:
0
机构:
IBM CORP,ALMADEN RES CTR,SAN JOSE,CA 95120
LI, L
COLLINS, G
论文数:
0
引用数:
0
h-index:
0
机构:
IBM CORP,ALMADEN RES CTR,SAN JOSE,CA 95120
COLLINS, G
机构
:
[1]
IBM CORP,ALMADEN RES CTR,SAN JOSE,CA 95120
[2]
COLORADO STATE UNIV,DEPT ELECT ENGN,FT COLLINS,CO 80523
来源
:
JOURNAL OF THE ELECTROCHEMICAL SOCIETY
|
1987年
/ 134卷
/ 8B期
关键词
:
D O I
:
暂无
中图分类号
:
O646 [电化学、电解、磁化学];
学科分类号
:
081704 ;
摘要
:
引用
收藏
页码:C436 / C436
页数:1
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