MULTILAYER APPLICATION OF UV HARDENING - PULSED ELECTRON-BEAMS RESIST HARDENING IN SOFT VACUUM

被引：0

作者：

HIRAOKA, H

LEE, J

HINSBERG, W

KRISHNASWAMY, J

LI, L

COLLINS, G

机构：

[1] IBM CORP,ALMADEN RES CTR,SAN JOSE,CA 95120

[2] COLORADO STATE UNIV,DEPT ELECT ENGN,FT COLLINS,CO 80523

来源：

JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 1987年 / 134卷 / 8B期

关键词：

D O I：

暂无

中图分类号：

O646 [电化学、电解、磁化学];

学科分类号：

081704 ;

摘要：

引用

页码：C436 / C436

页数：1

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