HIGHLY SENSITIVE POSITIVE ELECTRON-BEAM RESISTS BY ADDING QUATERNARY AMMONIUM-SALTS

被引：2
|
作者：
HAMADA, Y
TSUJINO, Y
YAMAZAKI, S
KUROKI, K
KUWANO, Y
机构：
来源：
JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 1988年 / 135卷 / 10期
关键词：
D O I：
10.1149/1.2095390
中图分类号：
O646 [电化学、电解、磁化学];
学科分类号：
081704 ;
摘要：
引用
收藏
页码：2606 / 2610
页数：5
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