HIGHLY SENSITIVE POSITIVE ELECTRON-BEAM RESISTS BY ADDING QUATERNARY AMMONIUM-SALTS

被引：2

作者：

HAMADA, Y

TSUJINO, Y

YAMAZAKI, S

KUROKI, K

KUWANO, Y

机构：

来源：

JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 1988年 / 135卷 / 10期

关键词：

D O I：

10.1149/1.2095390

中图分类号：

O646 [电化学、电解、磁化学];

学科分类号：

081704 ;

摘要：

引用

页码：2606 / 2610

页数：5

共 50 条

[41] RESISTS FOR ELECTRON-BEAM LITHOGRAPHY
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