BEHAVIOR OF THE SI/SIO2 INTERFACE OBSERVED BY FOWLER-NORDHEIM TUNNELING

被引：264
|
作者：
MASERJIAN, J
ZAMANI, N
机构：
来源：
JOURNAL OF APPLIED PHYSICS | 1982年 / 53卷 / 01期
关键词：
D O I：
10.1063/1.329919
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
引用
收藏
页码：559 / 567
页数：9
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