OSCILLATORY FIELD-DEPENDENCE OF FOWLER-NORDHEIM TUNNELING AS A PROBE OF THE SI-SIO2 INTERFACE

被引：0

作者：

ZAMANI, N ^{[1
]}

MASERJIAN, J ^{[1
]}

机构：

[1] CALTECH,JET PROP LAB,PASADENA,CA 91103

来源：

BULLETIN OF THE AMERICAN PHYSICAL SOCIETY | 1981年 / 26卷 / 03期

关键词：

D O I：

暂无

中图分类号：

O4 [物理学];

学科分类号：

0702 ;

摘要：

引用

页码：219 / 220

页数：2

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