BEHAVIOR OF THE SI/SIO2 INTERFACE OBSERVED BY FOWLER-NORDHEIM TUNNELING

被引：264

|

作者：

MASERJIAN, J

ZAMANI, N

机构：

来源：

JOURNAL OF APPLIED PHYSICS | 1982年 / 53卷 / 01期

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D O I：

10.1063/1.329919

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

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页码：559 / 567

页数：9

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