PHOTOLUMINESCENCE OF GAAS-LAYERS HYBRID-GROWN ON SI BY MBE AND LPE

被引:0
|
作者
YAZAWA, Y [1 ]
MINEMURA, T [1 ]
UNNO, T [1 ]
机构
[1] HITACHI CABLE LTD,MET RES LAB,HITACHI 31914,JAPAN
关键词
D O I
10.1016/0022-0248(91)90797-9
中图分类号
O7 [晶体学];
学科分类号
0702 ; 070205 ; 0703 ; 080501 ;
摘要
We have found extraordinary photoluminescence (PL) for GaAs layers grown on Si substrates by the MBE-LPE hybrid method, which is molecular beam epitaxy (MBE) combined with subsequent liquid phase epitaxy (LPE). The PL spectra showed only one broad peak with a large red-shift (44-98 meV) and large intensity compared with the exciton peak of an MBE-grown sample. The red-shift increased with raising the growth temperature of LPE for the hybrid growth. Si impurities unintentionally incorporated into the MBE-grown region as well as the LPE-grown region of the hybrid-grown GaAs layers were observed by SIMS measurements. The PL peaks with large red-shift of the hybrid-grown layers were considered to arise from a formation of additional energy levels in the band structure due to the compensated Si impurities in the LPE-grown region.
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页码:519 / 523
页数:5
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