CHARACTERIZATION OF MOCVD GROWN GA1-XALXAS FOR DOUBLE HETEROSTRUCTURE LASERS

被引:0
|
作者
GLEW, RW
GARRETT, B
BRIGGS, ATR
THRUSH, EJ
机构
关键词
D O I
10.1088/0268-1242/3/7/011
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
引用
收藏
页码:701 / 705
页数:5
相关论文
共 50 条
  • [21] DEGRADATION CHARACTERISTICS OF GA1-XALXAS VISIBLE DIODE-LASERS
    KAJIMURA, T
    KURODA, T
    YAMASHITA, S
    TODOKORO, H
    NAKAMURA, M
    UMEDA, J
    JAPANESE JOURNAL OF APPLIED PHYSICS, 1980, 19 : 431 - 436
  • [22] EFFECTS OF HYDROSTATIC-PRESSURE ON EMISSION OF GA1-XALXAS LASERS
    JURAVEL, Y
    HALPERN, T
    RACCAH, PM
    POLLAK, FH
    KRESSEL, H
    BULLETIN OF THE AMERICAN PHYSICAL SOCIETY, 1975, 20 (03): : 385 - 385
  • [23] IMPROVEMENT OF GAAS-GAALAS DOUBLE-HETEROSTRUCTURE LASER WAFER BY GA1-XALXAS BUFFER LAYER
    SHIMA, K
    MORIMOTO, M
    IMAI, H
    FUJIWARA, T
    TAKUSAGAWA, M
    APPLIED PHYSICS LETTERS, 1980, 37 (06) : 503 - 505
  • [24] THERMOELECTRIC PROPERTIES OF GA1-XALXAS
    HAVA, S
    HUNSPERGER, R
    JOURNAL OF APPLIED PHYSICS, 1985, 57 (12) : 5330 - 5336
  • [25] IMPLANTATION OF SELENIUM INTO GA1-XALXAS
    FAVENNEC, PN
    HENRY, L
    JANICKI, T
    ELECTRONICS LETTERS, 1977, 13 (12) : 338 - 339
  • [26] MOCVD GROWTH OF GAAS/GA1-XALXAS EPITAXIAL LAYERS FOR MONOLITHIC OPTOELECTRONIC DEVICES
    JONES, MW
    FORBES, N
    JOURNAL OF CRYSTAL GROWTH, 1984, 68 (01) : 466 - 473
  • [27] MAGNESIUM DOPING OF GA1-XALXAS
    DAWSON, LR
    JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1979, 126 (03) : C127 - C127
  • [28] DISORDER EFFECTS IN GA1-XALXAS
    WANG, XJ
    ZHANG, XY
    SOLID STATE COMMUNICATIONS, 1986, 59 (12) : 869 - 872
  • [29] DIFFUSION OF ZINC INTO GA1-XALXAS
    AGENO, SK
    ROEDEL, RJ
    MELLEN, N
    ESCHER, JS
    APPLIED PHYSICS LETTERS, 1985, 47 (11) : 1193 - 1195
  • [30] Ballistic electron emission microscopy of InAs/Ga1-xAlxAs relaxed heterostructure interfaces
    Ke, ML
    Westwood, DI
    Matthai, CC
    Richardson, B
    MATERIALS SCIENCE AND ENGINEERING B-SOLID STATE MATERIALS FOR ADVANCED TECHNOLOGY, 1995, 35 (1-3): : 349 - 352