A CRITICAL-REVIEW OF VAPOR-PHASE DEPOSITION METHODS FOR FERROELECTRIC THIN-FILMS

被引：0
|
作者：
KINGON, AI [1 ]
AUCIOLLO, A [1 ]
LICHTENWALNER, D [1 ]
HSIEH, KY [1 ]
机构：
[1] MICROELECTR CTR N CAROLINA,RES TRIANGLE PK,NC
来源：
FERROELECTRICS | 1992年 / 133卷 / 1-4期
关键词：
D O I：
10.1080/00150199208217967
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
[No abstract available]
引用
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页码：3 / 3
页数：1
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