A CRITICAL-REVIEW OF VAPOR-PHASE DEPOSITION METHODS FOR FERROELECTRIC THIN-FILMS

被引:0
|
作者
KINGON, AI [1 ]
AUCIOLLO, A [1 ]
LICHTENWALNER, D [1 ]
HSIEH, KY [1 ]
机构
[1] MICROELECTR CTR N CAROLINA,RES TRIANGLE PK,NC
关键词
D O I
10.1080/00150199208217967
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
[No abstract available]
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页码:3 / 3
页数:1
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