共 50 条
- [1] PHOTOMETRIC MONITORING OF THE OPTICAL-THICKNESS OF THE LAYERS OF WIDEBAND ANTIREFLECTION COATINGS SOVIET JOURNAL OF OPTICAL TECHNOLOGY, 1981, 48 (01): : 45 - 48
- [2] DEPOSITION OF ANTIREFLECTION COATINGS BY LASER PYROLYSIS SOVIET JOURNAL OF OPTICAL TECHNOLOGY, 1993, 60 (02): : 127 - 129
- [3] COMPUTER MODELING OF THE TRANSMISSION METHOD OF MONITORING THE LAYER THICKNESS OF OPTICAL COATINGS DURING THEIR DEPOSITION SOVIET JOURNAL OF OPTICAL TECHNOLOGY, 1993, 60 (02): : 115 - 116
- [4] DEPOSITION OF UNEQUAL-THICKNESS COATINGS USING OPTICAL MONITORING SOVIET JOURNAL OF OPTICAL TECHNOLOGY, 1988, 55 (03): : 170 - 171
- [5] Deposition and measurements of antireflection coatings for semiconductor lasers 12TH CZECH-SLOVAK-POLISH OPTICAL CONFERENCE ON WAVE AND QUANTUM ASPECTS OF CONTEMPORARY OPTICS, 2001, 4356 : 297 - 302
- [6] MONITORING FILM THICKNESS DURING A VACUUM DEPOSITION SOVIET JOURNAL OF OPTICAL TECHNOLOGY, 1976, 43 (08): : 490 - 491
- [8] DIRECTLY CONTROLLED DEPOSITION OF ANTIREFLECTION COATINGS FOR SEMICONDUCTOR-LASERS APPLIED OPTICS, 1987, 26 (05): : 845 - 849
- [9] Wide Band Antireflection Coatings Deposited by Atomic Layer Deposition NANOEPITAXY: MATERIALS AND DEVICES V, 2013, 8820