A CIRCUIT FOR MONITORING THICKNESS OF FILMS DURING VACUUM DEPOSITION

被引：0

作者：

VEMURI, V

机构：

来源：

INDIAN JOURNAL OF PURE & APPLIED PHYSICS | 1966年 / 4卷 / 09期

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暂无

中图分类号：

O4 [物理学];

学科分类号：

0702 ;

摘要：

引用

页码：364 / &

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[1] INSTRUMENT FOR MONITORING THE THICKNESS AND DEPOSITION RATE OF FILMS DURING VACUUM EVAPORATION
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[6] A METHOD FOR CONTINUOUS MEASUREMENT OF THICKNESS AND DEPOSITION RATE OF CONDUCTING FILMS DURING A VACUUM EVAPORATION
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[7] DEVICE FOR VACUUM DEPOSITION OF THIN FILMS OF STIPULATED THICKNESS.
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[8] INTERFERENCE METHOD FOR MONITORING THE REFRACTIVE-INDEX AND THE THICKNESS OF TRANSPARENT FILMS DURING DEPOSITION
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[9] TEMPERATURES DURING VACUUM DEPOSITION OF METAL FILMS
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[10] THICKNESS MONITORING DURING DEPOSITION OF ANTIREFLECTION COATINGS
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