THIN-FILM PREPARATION BY PLASMA AND LOW-PRESSURE CVD IN A HORIZONTAL REACTOR

被引：5

|

作者：

MOROSANU, CE

SOLTUZ, V

机构：

来源：

VACUUM | 1981年 / 31卷 / 07期

关键词：

D O I：

10.1016/S0042-207X(81)80502-7

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

收藏

页码：309 / 313

页数：5

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