THIN-FILM PREPARATION BY PLASMA AND LOW-PRESSURE CVD IN A HORIZONTAL REACTOR

被引：5
|
作者：
MOROSANU, CE
SOLTUZ, V
机构：
来源：
VACUUM | 1981年 / 31卷 / 07期
关键词：
D O I：
10.1016/S0042-207X(81)80502-7
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
引用
收藏
页码：309 / 313
页数：5
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