REACTIVE MAGNETRON SPUTTERING ON GLASS

被引：0
|
作者：
ZEGA, B
机构：
来源：
THIN SOLID FILMS | 1981年 / 77卷 / 1-3期
关键词：
D O I：
10.1016/0040-6090(81)90382-5
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
引用
收藏
页码：271 / 271
页数：1
相关论文
共 50 条
  • [31] A unit for magnetron sputtering of coatings on glass panels
    Zhadkevich, M.L.
    Trofimyak, V.N.
    Avtomaticheskaya Svarka, 2003, (03): : 54 - 55
  • [32] Influence of unbalanced magnetron and Penning ionization for RF reactive magnetron sputtering
    Miyazaki, Hidetoshi
    Kamei, Masayuki
    Shigesato, Yuzo
    Yasui, Itaru
    Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers, 1999, 38 (1 A): : 186 - 191
  • [33] Influence of unbalanced magnetron and penning ionization for RF reactive magnetron sputtering
    Miyazaki, H
    Kamei, M
    Shigesato, Y
    Yasui, I
    JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS, 1999, 38 (1A): : 186 - 191
  • [34] Effects of Sputtering Power on PtOx Films Prepared by Reactive Magnetron Sputtering
    Kang, Wenbo
    Zhu, Dongmei
    Huang, Zhibin
    Zhou, Wancheng
    Luo, Fa
    JOURNAL OF NANOSCIENCE AND NANOTECHNOLOGY, 2017, 17 (06) : 3848 - 3852
  • [35] The sputtering of titanium magnetron target with increased temperature in reactive atmosphere by gas injection magnetron sputtering technique
    Chodun, Rafal
    Dypa, Marlena
    Wicher, Bartosz
    Langier, Katarzyna Nowakowska -
    Okrasa, Sebastian
    Minikayev, Roman
    Zdunek, Krzysztof
    APPLIED SURFACE SCIENCE, 2022, 574
  • [36] Synthesis and characterization of inorganic silicon oxycarbide glass thin films by reactive rf-magnetron sputtering
    Ryan, Joseph V.
    Pantano, C. G.
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A, 2007, 25 (01): : 153 - 159
  • [37] Reactive sputtering of δ-ZrH2 thin films by high power impulse magnetron sputtering and direct current magnetron sputtering
    Hogberg, Hans
    Tengdelius, Lina
    Samuelsson, Mattias
    Eriksson, Fredrik
    Broitman, Esteban
    Lu, Jun
    Jensen, Jens
    Hultman, Lars
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A, 2014, 32 (04):
  • [38] Reactive ionized magnetron sputtering of crystalline alumina coatings
    Schneider, JM
    Sproul, WD
    Matthews, A
    SURFACE & COATINGS TECHNOLOGY, 1998, 98 (1-3): : 1473 - 1476
  • [39] Aluminum nitride films prepared by reactive magnetron sputtering
    Muhl, S
    Zapien, JA
    Mendez, JM
    Andrade, E
    JOURNAL OF PHYSICS D-APPLIED PHYSICS, 1997, 30 (15) : 2147 - 2155
  • [40] Hard nanocomposite films prepared by reactive magnetron sputtering
    Musil, J
    NANOSTRUCTURED THIN FILMS AND NANODISPERSION STRENGTHENED COATINGS, 2004, 155 : 43 - 56
12345