Influence of unbalanced magnetron and Penning ionization for RF reactive magnetron sputtering

被引：0
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作者：
Miyazaki, Hidetoshi [2 ]
Kamei, Masayuki [2 ]
Shigesato, Yuzo [1 ]
Yasui, Itaru [2 ]
机构：
[1] Department of Chemistry, Aoyama Gakuin University, 6-16-1 Chitosedai, Setagaya-ku, Tokyo, Japan
[2] Institute of Industrial Science, University of Tokyo, 7-22-1 Roppongi, Minato-ku, Tokyo, Japan
来源：
Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers | 1999年 / 38卷 / 1 A期
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页码：186 / 191
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