REACTIVE MAGNETRON SPUTTERING ON GLASS

被引：0
|
作者：
ZEGA, B
机构：
来源：
THIN SOLID FILMS | 1981年 / 77卷 / 1-3期
关键词：
D O I：
10.1016/0040-6090(81)90382-5
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
引用
收藏
页码：271 / 271
页数：1
相关论文
共 50 条
  • [21] THE EFFECT OF PLASMA ACTIVATION OF REACTIVE GAS IN REACTIVE MAGNETRON SPUTTERING
    Dudin, Stanislav V.
    Yakovin, Stanislav D.
    Zykov, Aleksandr V.
    EAST EUROPEAN JOURNAL OF PHYSICS, 2023, (03): : 606 - 612
  • [22] REACTIVE MAGNETRON SPUTTERING OF TITANIUM AND ITS OXIDES
    NYAIESH, AR
    HOLLAND, L
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1982, 20 (04): : 1389 - 1392
  • [23] On reactive high power impulse magnetron sputtering
    Gudmundsson, J. T.
    PLASMA PHYSICS AND CONTROLLED FUSION, 2016, 58 (01)
  • [24] Design and reactive magnetron sputtering of thermochromic coatings
    Houska, Jiri
    JOURNAL OF APPLIED PHYSICS, 2022, 131 (11)
  • [25] Controllability Analysis of Reactive Magnetron Sputtering Process
    Ahmad, Z.
    Abdallah, B.
    ACTA PHYSICA POLONICA A, 2013, 123 (01) : 3 - 6
  • [26] Fuzzy PI control of reactive magnetron sputtering
    Zhang, Jun
    Ye, Min
    Zhang, Xinrong
    Zhang, Daopei
    Zhenkong Kexue yu Jishu Xuebao/Journal of Vacuum Science and Technology, 2015, 35 (06): : 650 - 656
  • [27] Deposition of copper oxide by reactive magnetron sputtering
    J. H. Lee
    K. H. Jeong
    W. H. Cho
    W. J. Ho
    H. J. Yang
    C. S. Kim
    J. G. Lee
    Metals and Materials International, 2011, 17 : 917 - 921
  • [28] Modeling reactive magnetron sputtering: Opportunities and challenges
    Depla, D.
    Strijckmans, K.
    Dulmaa, A.
    Cougnon, F.
    Dedoncker, R.
    Schelfhout, R.
    Schramm, I
    Moens, F.
    De Gryse, R.
    THIN SOLID FILMS, 2019, 688
  • [29] Deposition of Copper Oxide by Reactive Magnetron Sputtering
    Lee, J. H.
    Jeong, K. H.
    Cho, W. H.
    Ho, W. J.
    Yang, H. J.
    Kim, C. S.
    Lee, J. G.
    METALS AND MATERIALS INTERNATIONAL, 2011, 17 (06) : 917 - 921
  • [30] Atomic nitrogen source for reactive magnetron sputtering
    Godfroid, T
    Dauchot, JP
    Hecq, M
    SURFACE & COATINGS TECHNOLOGY, 2003, 174 : 1276 - 1281
12345