IONIZATION ENHANCED MIGRATION OF THE ISOLATED VACANCY IN PARA-TYPE SILICON

被引:0
|
作者
CHATTERJEE, AP [1 ]
WATKINS, GD [1 ]
机构
[1] LEHIGH UNIV,BETHLEHEM,PA 18015
来源
关键词
D O I
暂无
中图分类号
O4 [物理学];
学科分类号
0702 ;
摘要
引用
收藏
页码:325 / 325
页数:1
相关论文
共 50 条
  • [31] STUDY OF PRIMARY AND SECONDARY RADIATION DEFECTS FORMATION AND ANNEALING IN PARA-TYPE SILICON
    MUKASHEV, BN
    KOLODIN, LG
    NUSSUPOV, KH
    SPITSYN, AV
    VAVILOV, VS
    RADIATION EFFECTS AND DEFECTS IN SOLIDS, 1980, 46 (1-2): : 79 - 84
  • [32] EFFECT OF COMPENSATION ON IONIZATION-ENERGY OF MULTIPLY CHARGED IMPURITIES IN PARA-TYPE INSB
    KURILENKO, IN
    LITVAKGORSKAYA, LB
    LUGOVAYA, GY
    KHLYSTOVSKAYA, MD
    SOVIET PHYSICS SEMICONDUCTORS-USSR, 1977, 11 (06): : 664 - 667
  • [33] PROPERTIES OF UNDOPED AND PARA-TYPE HYDROGENATED AMORPHOUS-SILICON CARBIDE FILMS
    CHAUDHURI, P
    RAY, S
    BATABYAL, AK
    BARUA, AK
    THIN SOLID FILMS, 1984, 121 (03) : 233 - 246
  • [34] POLARIZATION BEHAVIOR OF THE NORMAL-TYPE AND PARA-TYPE SILICON IN SULFURIC-ACID HYDROQUINONE SOLUTIONS
    STERNBERG, S
    UNGUREANU, M
    BRANZOI, V
    APATEANU, L
    REVUE ROUMAINE DE CHIMIE, 1985, 30 (02) : 105 - 110
  • [35] SUPERLINEAR CURRENT DENSITY VS ELECTRIC FIELD IN PARA-TYPE SILICON-ON-SAPPHIRE
    ROSS, EC
    WARFIELD, G
    JOURNAL OF APPLIED PHYSICS, 1970, 41 (06) : 2657 - &
  • [36] SCHOTTKY CONTACT BARRIER HEIGHT ENHANCEMENT ON PARA-TYPE SILICON BY WET CHEMICAL ETCHING
    ADEGBOYEGA, GA
    POGGI, A
    SUSI, E
    CASTALDINI, A
    CAVALLINI, A
    APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING, 1989, 48 (04): : 391 - 395
  • [37] ANALYSIS OF A AC SURFACE PHOTOVOLTAGES IN A DEPLETED OXIDIZED PARA-TYPE SILICON-WAFER
    MUNAKATA, C
    NISHIMATSU, S
    JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 1986, 25 (06): : 807 - 812
  • [38] ELECTROCATALYTIC REDUCTION OF CARBON-DIOXIDE AT ILLUMINATED PARA-TYPE SILICON SEMICONDUCTING ELECTRODES
    BRADLEY, MG
    TYSAK, T
    GRAVES, DJ
    VLACHOPOULOS, NA
    JOURNAL OF THE CHEMICAL SOCIETY-CHEMICAL COMMUNICATIONS, 1983, (07) : 349 - 350
  • [39] EFFECTS OF POSITIVELY CHARGED ACCEPTOR CENTERS ON CYCLOTRON-RESONANCE IN PARA-TYPE SILICON
    OHYAMA, T
    SANADA, T
    OTSUKA, E
    JOURNAL OF THE PHYSICAL SOCIETY OF JAPAN, 1973, 34 (05) : 1245 - 1247
  • [40] EFFECT OF OXYGEN AND COPPER ON DEFECT CLUSTER IN NEUTRON-IRRADIATED PARA-TYPE SILICON
    USAMI, A
    TOKUDA, Y
    JOURNAL OF APPLIED PHYSICS, 1974, 45 (07) : 2823 - 2831