THERMAL-OXIDATION OF HAFNIUM SILICIDE FILMS ON SILICON

被引：49
|
作者：
MURARKA, SP
CHANG, CC
机构：
来源：
APPLIED PHYSICS LETTERS | 1980年 / 37卷 / 07期
关键词：
D O I：
10.1063/1.92005
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
引用
收藏
页码：639 / 641
页数：3
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