ATOMIC OXYGEN AND THE THERMAL-OXIDATION OF SILICON

被引：28
|
作者：
HOFF, AM
RUZYLLO, J
机构：
来源：
APPLIED PHYSICS LETTERS | 1988年 / 52卷 / 15期
关键词：
D O I：
10.1063/1.99676
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
引用
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页码：1264 / 1265
页数：2
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