THE LITHOGRAPHIC EFFECT OF ELECTRON-BEAM ON POLY(METHYL METHACRYLATE) IN A SCANNING ELECTRON-MICROSCOPE - MINIMIZATION OF LINE-WIDTH BY THE DOSE AND BEAM CURRENT

被引：2

|

作者：

MUCHOVA, M

PELZBAUER, Z

机构：

来源：

JOURNAL OF APPLIED POLYMER SCIENCE | 1989年 / 37卷 / 03期

关键词：

D O I：

10.1002/app.1989.070370317

中图分类号：

O63 [高分子化学（高聚物）];

学科分类号：

070305 ; 080501 ; 081704 ;

摘要：

引用

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页码：817 / 824

页数：8

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