共 50 条
- [2] Line-width controllability depending on electron-beam blur and resist thickness [J]. EMERGING LITHOGRAPHIC TECHNOLOGIES II, 1998, 3331 : 442 - 449
- [4] Topography impacts on line-width control for gate level lithography [J]. Advances in Resist Technology and Processing XXII, Pt 1 and 2, 2005, 5753 : 699 - 707
- [7] CURRENT CONTROL TECHNIQUE IN ELECTRON-BEAM LITHOGRAPHY [J]. JOURNAL OF PHYSICS E-SCIENTIFIC INSTRUMENTS, 1980, 13 (02): : 163 - 164
- [9] ELECTRON-BEAM LITHOGRAPHY [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1982, 20 (03): : 781 - 785
- [10] ELECTRON-BEAM LITHOGRAPHY [J]. BULLETIN OF THE AMERICAN PHYSICAL SOCIETY, 1977, 22 (03): : 276 - 276