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INTERFACE CHARACTERISTICS OF SILICON-SILICON NITRIDE STRUCTURES
被引:0
|
作者
:
CHU, TL
论文数:
0
引用数:
0
h-index:
0
CHU, TL
SZEDON, JR
论文数:
0
引用数:
0
h-index:
0
SZEDON, JR
LEE, CH
论文数:
0
引用数:
0
h-index:
0
LEE, CH
机构
:
来源
:
JOURNAL OF THE ELECTROCHEMICAL SOCIETY
|
1966年
/ 113卷
/ 08期
关键词
:
D O I
:
暂无
中图分类号
:
O646 [电化学、电解、磁化学];
学科分类号
:
081704 ;
摘要
:
引用
收藏
页码:C214 / &
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