STUDY OF ELECTROCHEMICAL ETCH-STOP FOR HIGH-PRECISION THICKNESS CONTROL OF SILICON MEMBRANES

被引：126
|
作者：
KLOECK, B [1 ]
COLLINS, SD [1 ]
DEROOIJ, NF [1 ]
SMITH, RL [1 ]
机构：
[1] UNIV CALIF DAVIS,DEPT ELECT ENGN & COMP SCI,DAVIS,CA 95616
来源：
IEEE TRANSACTIONS ON ELECTRON DEVICES | 1989年 / 36卷 / 04期
关键词：
D O I：
10.1109/16.22472
中图分类号：
TM [电工技术]; TN [电子技术、通信技术];
学科分类号：
0808 ; 0809 ;
摘要：
引用
收藏
页码：663 / 669
页数：7
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