SPECTRAL CHARACTERISTICS OF AR-N-2, AR-O-2, AR-HE MIXED GAS INDUCTIVELY COUPLED PLASMAS .2.

被引:39
|
作者
CHOOT, EH [1 ]
HORLICK, G [1 ]
机构
[1] UNIV ALBERTA,DEPT CHEM,EDMONTON T6G 2G2,ALBERTA,CANADA
关键词
D O I
10.1016/0584-8547(86)80095-7
中图分类号
O433 [光谱学];
学科分类号
0703 ; 070302 ;
摘要
引用
收藏
页码:907 / 924
页数:18
相关论文
共 50 条
  • [21] Determination of Ar metastable atom densities in Ar and Ar/H2 inductively coupled low-temperature plasmas
    Fox-Lyon, N.
    Knoll, A. J.
    Franek, J.
    Demidov, V.
    Godyak, V.
    Koepke, M.
    Oehrlein, G. S.
    JOURNAL OF PHYSICS D-APPLIED PHYSICS, 2013, 46 (48)
  • [22] Etching Characteristics and Mechanisms of TiO2 Thin Films in HBr/Ar and Cl2/Ar Inductively-Coupled Plasmas
    Hanbyeol Jang
    Alexander Efremov
    Daehee Kim
    Sungchil Kang
    Sun Jin Yun
    Kwang-Ho Kwon
    Plasma Chemistry and Plasma Processing, 2012, 32 : 333 - 342
  • [23] Electron temperatures of inductively coupled Cl2-Ar plasmas
    Fuller, NCM
    Donnelly, VM
    Herman, IP
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 2002, 20 (01): : 170 - 173
  • [24] Etching Characteristics and Mechanisms of TiO2 Thin Films in CF4 + Ar, Cl2 + Ar and HBr plus Ar Inductively Coupled Plasmas
    Lee, Junmyung
    Efremov, Alexander
    Lee, Byung Jun
    Kwon, Kwang-Ho
    PLASMA CHEMISTRY AND PLASMA PROCESSING, 2016, 36 (06) : 1571 - 1588
  • [25] CROSSED-MOLECULAR-BEAM MEASUREMENTS OF TOTAL CROSS SECTIONS OF AR-N2 AR-NE AR-HE AND AR-H2 AT THERMAL ENERGIES
    LANDORF, RW
    MUELLER, CR
    JOURNAL OF CHEMICAL PHYSICS, 1966, 45 (01): : 240 - &
  • [26] A CRITICAL COMPARISON OF AR AND AR-N2 INDUCTIVELY COUPLED PLASMAS AS EXCITATION SOURCES FOR ATOMIC EMISSION-SPECTROMETRY
    MONTASER, A
    FASSEL, VA
    ZALEWSKI, J
    APPLIED SPECTROSCOPY, 1981, 35 (03) : 292 - 302
  • [27] SCATTERING OF HIGH-VELOCITY NEUTRAL PARTICLES .16. AR-AR, AR-HE, AND AR-H2
    COLGATE, SO
    JORDAN, JE
    AMDUR, I
    MASON, EA
    JOURNAL OF CHEMICAL PHYSICS, 1969, 51 (03): : 968 - &
  • [28] Neutral gas temperature estimate in CF4/O2/Ar inductively coupled plasmas
    Cruden, BA
    Rao, MVVS
    Sharma, SP
    Meyyappan, M
    APPLIED PHYSICS LETTERS, 2002, 81 (06) : 990 - 992
  • [29] Numerical study of the effect of gas flow in low pressure inductively coupled Ar/N2 plasmas
    Tong, Lizhu
    CENTRAL EUROPEAN JOURNAL OF PHYSICS, 2012, 10 (04): : 888 - 897
  • [30] Etching characteristics and mechanisms of SrBi2Ta2O9 thin films in CF4/Ar and Cl2/Ar inductively coupled plasmas
    Efremov, AM
    Kim, DP
    Kim, CI
    THIN SOLID FILMS, 2005, 471 (1-2) : 328 - 335