EPITAXIAL GROWTH OF SILICON CARBIDE

被引:3
|
作者
BRANDER, RW
机构
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D O I
10.1149/1.2426276
中图分类号
O646 [电化学、电解、磁化学];
学科分类号
081704 ;
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页码:881 / 883
页数:3
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