A REVIEW OF SUBMICRON LITHOGRAPHY

被引：19
|
作者：
SMITH, HI
机构：
来源：
SUPERLATTICES AND MICROSTRUCTURES | 1986年 / 2卷 / 02期
关键词：
D O I：
10.1016/0749-6036(86)90077-7
中图分类号：
O469 [凝聚态物理学];
学科分类号：
070205 ;
摘要：
引用
收藏
页码：129 / 142
页数：14
相关论文
共 50 条
  • [21] APPLICATION OF THE PHOTOCLEAVE TECHNIQUE IN SUBMICRON CONTACT WINDOW LITHOGRAPHY
    YANG, T
    CUTHBERT, JD
    DARDZINSKI, BJ
    SCHROPE, DE
    1989 INTERNATIONAL SYMPOSIUM ON VLSI TECHNOLOGY, SYSTEMS AND APPLICATIONS: PROCEEDINGS OF TECHNICAL PAPERS, 1989, : 342 - 346
  • [22] Multilayer resists with variable layer parameters for submicron lithography
    Aristov, V.V.
    Dmitriyeva, V.A.
    Kudryashov, V.A.
    Pfeiffer, K.
    Lorkowski, H.-J.
    Microelectronic Engineering, 1990, 11 (1-4) : 553 - 556
  • [23] SUBMICRON LITHOGRAPHY ENABLING PANEL BASED HETEROGENEOUS INTEGRATION
    Shelton, Doug
    Mori, Ken-Ichiro
    Goto, Yoshio
    Wada, Hiroyuki
    Tanaka, Hideo
    Suda, Hiromi
    Miura, Seiya
    2020 INTERNATIONAL WAFER LEVEL PACKAGING CONFERENCE (IWLPC), 2020,
  • [24] Submicron patterning on flexible substrates by reduction optical lithography
    de Laat, Wim J. M.
    Peter, Maria
    Furthner, Francois
    Giesen, Peter T. M.
    Gui, Cheng-Qun
    Meinders, Erwin R.
    EMERGING LITHOGRAPHIC TECHNOLOGIES XII, PTS 1 AND 2, 2008, 6921
  • [25] MICRON AND SUBMICRON LITHOGRAPHY FOR VLSI DEVICE FABRICATION.
    Varnell, G.L.
    Scanning Electron Microscopy, 1981, : 343 - 350
  • [26] Linear alignment correction algorithm for deep submicron lithography
    Ziger, DH
    Leroux, P
    METROLOGY, INSPECTION, AND PROCESS CONTROL FOR MICROLITHOGRAPHY XVI, PTS 1 & 2, 2002, 4689 : 1057 - 1069
  • [27] Submicron-size patterning on the sapphire substrate prepared by nanosphere lithography and nanoimprint lithography techniques
    Chang, Chun-Ming
    Shiao, Ming-Hua
    Chiang, Donyau
    Yang, Chin-Tien
    Huang, Mao-Jung
    Hsueh, Wen-Jeng
    METALS AND MATERIALS INTERNATIONAL, 2013, 19 (04) : 869 - 874
  • [28] Submicron-size patterning on the sapphire substrate prepared by nanosphere lithography and nanoimprint lithography techniques
    Chun-Ming Chang
    Ming-Hua Shiao
    Donyau Chiang
    Chin-Tien Yang
    Mao-Jung Huang
    Wen-Jeng Hsueh
    Metals and Materials International, 2013, 19 : 869 - 874
  • [29] AN I-LINE IMAGE REVERSAL PROCESS FOR SUBMICRON LITHOGRAPHY
    CHU, R
    SINGH, B
    ADVANCES IN RESIST TECHNOLOGY AND PROCESSING VI, 1989, 1086 : 573 - 584
  • [30] Fabrication of submicron structures by three-dimensional laser lithography
    Shishkin, I. I.
    Rybin, M. V.
    Samusev, K. B.
    Limonov, M. F.
    Kiyan, R. V.
    Chichkov, B. N.
    Kivshar', Yu. S.
    Belov, P. A.
    JETP LETTERS, 2014, 99 (09) : 531 - 534
12345