A REVIEW OF SUBMICRON LITHOGRAPHY

被引：19
|
作者：
SMITH, HI
机构：
来源：
SUPERLATTICES AND MICROSTRUCTURES | 1986年 / 2卷 / 02期
关键词：
D O I：
10.1016/0749-6036(86)90077-7
中图分类号：
O469 [凝聚态物理学];
学科分类号：
070205 ;
摘要：
引用
收藏
页码：129 / 142
页数：14
相关论文
共 50 条
  • [1] SUBMICRON LITHOGRAPHY IN JAPAN
    SHIBAYAMA, K
    KATO, T
    POLYMER ENGINEERING AND SCIENCE, 1986, 26 (16): : 1140 - 1144
  • [2] OPTICAL METHODS IN SUBMICRON LITHOGRAPHY
    GENKIN, VN
    IZVESTIYA AKADEMII NAUK SSSR SERIYA FIZICHESKAYA, 1987, 51 (02): : 372 - 377
  • [3] Nanomolding: A submicron lithography alternative
    不详
    SOLID STATE TECHNOLOGY, 1999, 42 (06) : 22 - +
  • [4] AUTOMATED CELLS FOR SUBMICRON LITHOGRAPHY
    HUME, E
    MUELLER, R
    SCHICK, H
    CONWAY, J
    JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1987, 134 (8B) : C448 - C448
  • [5] Talbot Lithography as an Alternative for Contact Lithography for Submicron Features
    Dunbar, L. A.
    Nguyen, D.
    Timotijevic, B.
    Vogler, U.
    Veseli, S.
    Bergonzi, G.
    Angeloni, S.
    Bramati, A.
    Voelkel, R.
    Stanley, R. P.
    ADVANCED FABRICATION TECHNOLOGIES FOR MICRO/NANO OPTICS AND PHOTONICS VII, 2014, 8974
  • [6] REDUCTION LENSES FOR SUBMICRON LITHOGRAPHY.
    Omata, Takashi
    1600, (27):
  • [7] Deep submicron excimer laser lithography
    Lu, Dunwu
    Huang, Huijie
    Yan, Yu
    Du, Longlong
    Gao, Ruichang
    Guangxue Xuebao/Acta Optica Sinica, 1996, 16 (08): : 1169 - 1172
  • [8] FOCUS - THE CRITICAL PARAMETER FOR SUBMICRON LITHOGRAPHY
    LEVINSON, HJ
    ARNOLD, WH
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1987, 5 (01): : 293 - 298
  • [9] Biomolecular recognition using submicron laser lithography
    Shivashankar, GV
    Libchaber, A
    APPLIED PHYSICS LETTERS, 1998, 73 (03) : 417 - 419
  • [10] DIAMOND MEMBRANES WITH CONTROLLED STRESS FOR SUBMICRON LITHOGRAPHY
    SCHAFER, L
    BLUHM, A
    KLAGES, CP
    LOCHEL, B
    BUCHMANN, LM
    HUBER, HL
    DIAMOND AND RELATED MATERIALS, 1993, 2 (08) : 1191 - 1196
12345