Deep submicron excimer laser lithography

被引：0

作者：

Lu, Dunwu ^{[1
]}

Huang, Huijie ^{[1
]}

Yan, Yu ^{[1
]}

Du, Longlong ^{[1
]}

Gao, Ruichang ^{[1
]}

机构：

[1] Shanghai Inst of Optics & Fine, Mechanics, Chinese Acad of Sciences, Shanghai, China

来源：

Guangxue Xuebao/Acta Optica Sinica | 1996年 / 16卷 / 08期

关键词：

D O I：

暂无

中图分类号：

学科分类号：

摘要：

引用

页码：1169 / 1172

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