Deep submicron excimer laser lithography

被引：0
|
作者：
Lu, Dunwu [1 ]
Huang, Huijie [1 ]
Yan, Yu [1 ]
Du, Longlong [1 ]
Gao, Ruichang [1 ]
机构：
[1] Shanghai Inst of Optics & Fine, Mechanics, Chinese Acad of Sciences, Shanghai, China
来源：
Guangxue Xuebao/Acta Optica Sinica | 1996年 / 16卷 / 08期
关键词：
D O I：
暂无
中图分类号：
学科分类号：
摘要：
5
引用
收藏
页码：1169 / 1172
相关论文
共 50 条
  • [21] ArF excimer laser for 193 nm lithography
    Stamm, U
    Patzel, R
    Kleinschmidt, J
    Vogler, K
    Zschocke, W
    Bragin, I
    Basting, D
    OPTICAL MICROLITHOGRAPHY XI, 1998, 3334 : 1010 - 1013
  • [22] ArF excimer laser for 193 nm lithography
    Stamm, U
    Kleinschmidt, J
    Heist, P
    Bragin, I
    Patzel, R
    Basting, D
    OPTICAL MICROLITHOGRAPHY X, 1997, 3051 : 868 - 873
  • [23] RECIPROCITY BEHAVIOR OF PHOTORESISTS IN EXCIMER LASER LITHOGRAPHY
    RICE, S
    JAIN, K
    IEEE TRANSACTIONS ON ELECTRON DEVICES, 1984, 31 (01) : 1 - 3
  • [24] NEW ALIGNMENT SYSTEM FOR EXCIMER LASER LITHOGRAPHY
    YAMAMOTO, M
    TAKEUCHI, H
    SUGIYAMA, Y
    AOKI, S
    SATO, T
    INTERNATIONAL JOURNAL OF THE JAPAN SOCIETY FOR PRECISION ENGINEERING, 1992, 26 (01): : 60 - 61
  • [25] QUARTER MICRON KRF EXCIMER LASER LITHOGRAPHY
    SASAGO, M
    ENDO, M
    TANI, Y
    KOBAYASHI, S
    KOIZUMI, T
    MATSUO, T
    YAMASHITA, K
    NOMURA, N
    IEICE TRANSACTIONS ON ELECTRONICS, 1993, E76C (04) : 582 - 587
  • [26] Excimer laser for 157nm lithography
    Stamm, U
    Bragin, I
    Govorkov, S
    Kleinschmidt, J
    Pätzel, R
    Slobodtchikov, E
    Vogler, K
    Voss, F
    Basting, D
    EMERGING LITHOGRAPHIC TECHNOLOGIES III, PTS 1 AND 2, 1999, 3676 : 816 - 826
  • [27] Lithography Technology Using a KrF Excimer Laser
    Yamaguchi, A.
    Nakao, S.
    Wakamiya, W.
    Mitsubishi Denki Giho, 71 (03):
  • [28] EXCIMER LASER STEPPER FOR SUBHALF MICRON LITHOGRAPHY
    TANIMOTO, A
    MIYAJI, A
    ICHIHARA, Y
    UEMURA, T
    TANAKA, I
    OPTICAL/LASER MICROLITHOGRAPHY II, 1989, 1088 : 434 - 440
  • [29] Excimer laser projection lithography: optical considerations
    Ehrlich, D.J.
    Rothschild, M.
    Microelectronic Engineering, 1989, 9 (1-4): : 27 - 29
  • [30] Prospects and challenges of ArF excimer laser lithography
    Yokohama Research Cent./Assoc. of, Super-Advanced Electronics, Technologies
    Proc SPIE Int Soc Opt Eng, 1600, (190-192):
12345