Deep submicron excimer laser lithography

被引：0
|
作者：
Lu, Dunwu [1 ]
Huang, Huijie [1 ]
Yan, Yu [1 ]
Du, Longlong [1 ]
Gao, Ruichang [1 ]
机构：
[1] Shanghai Inst of Optics & Fine, Mechanics, Chinese Acad of Sciences, Shanghai, China
来源：
Guangxue Xuebao/Acta Optica Sinica | 1996年 / 16卷 / 08期
关键词：
D O I：
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中图分类号：
学科分类号：
摘要：
5
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页码：1169 / 1172
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