OBSERVATION OF SLIP DISLOCATIONS IN (100) SILICON-WAFERS AFTER BF2 ION-IMPLANTATION AND RAPID THERMAL ANNEALING

被引：6
|
作者：
RITZ, KN [1 ]
DELFINO, M [1 ]
COOPER, CB [1 ]
POWELL, RA [1 ]
机构：
[1] VARIAN ASSOCIATES,VARIAN RES CTR,PALO ALTO,CA 94303
来源：
JOURNAL OF APPLIED PHYSICS | 1986年 / 60卷 / 02期
关键词：
D O I：
10.1063/1.337377
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
引用
收藏
页码：800 / 802
页数：3
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