LOW-PRESSURE PROCESSES IN CHEMICAL VAPOR-DEPOSITION OF SILICON-OXIDES

被引：10
|
作者：
WILKES, JG
机构：
来源：
JOURNAL OF CRYSTAL GROWTH | 1984年 / 70卷 / 1-2期
关键词：
D O I：
10.1016/0022-0248(84)90273-2
中图分类号：
O7 [晶体学];
学科分类号：
0702 ; 070205 ; 0703 ; 080501 ;
摘要：
引用
收藏
页码：271 / 279
页数：9
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