LOW-PRESSURE PROCESSES IN CHEMICAL VAPOR-DEPOSITION OF SILICON-OXIDES

被引：10

|

作者：

WILKES, JG

机构：

来源：

JOURNAL OF CRYSTAL GROWTH | 1984年 / 70卷 / 1-2期

关键词：

D O I：

10.1016/0022-0248(84)90273-2

中图分类号：

O7 [晶体学];

学科分类号：

0702 ; 070205 ; 0703 ; 080501 ;

摘要：

引用

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页码：271 / 279

页数：9

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