HIGH-TEMPERATURE PLASMA-ETCHING OF SILICON AND SILICON DIOXIDE

被引：0
|
作者：
CHIU, KCR
SNOW, WR
机构：
[1] SYNERTEK INC,SANTA CLARA,CA 95051
[2] PACIFIC WESTERN SYST INC,MT VIEW,CA 94041
来源：
JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 1983年 / 130卷 / 03期
关键词：
D O I：
暂无
中图分类号：
O646 [电化学、电解、磁化学];
学科分类号：
081704 ;
摘要：
引用
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页码：C81 / C81
页数：1
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