ROLE OF SULFUR-ATOMS IN MICROWAVE PLASMA-ETCHING OF SILICON

被引：38
|
作者：
NINOMIYA, K
SUZUKI, K
NISHIMATSU, S
OKADA, O
机构：
来源：
JOURNAL OF APPLIED PHYSICS | 1987年 / 62卷 / 04期
关键词：
D O I：
10.1063/1.339652
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
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页码：1459 / 1468
页数：10
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