COMPARISON OF IMAGE SHORTENING EFFECTS IN X-RAY AND OPTICAL LITHOGRAPHY

被引：9
|
作者：
DELLAGUARDIA, R
MALDONADO, JR
PREIN, F
ZELL, T
KLUWE, A
OERTEL, HK
机构：
[1] SIEMENS CORP,PRINCETON,NJ 08540
[2] FRAUNHOFER INST SILIZIUMTECHNOL,D-14199 BERLIN 33,GERMANY
来源：
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 1994年 / 12卷 / 06期
关键词：
D O I：
10.1116/1.587578
中图分类号：
TM [电工技术]; TN [电子技术、通信技术];
学科分类号：
0808 ; 0809 ;
摘要：
引用
收藏
页码：3936 / 3942
页数：7
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