COMPARISON OF IMAGE SHORTENING EFFECTS IN X-RAY AND OPTICAL LITHOGRAPHY

被引：9

作者：

DELLAGUARDIA, R

MALDONADO, JR

PREIN, F

ZELL, T

KLUWE, A

OERTEL, HK

机构：

[1] SIEMENS CORP,PRINCETON,NJ 08540

[2] FRAUNHOFER INST SILIZIUMTECHNOL,D-14199 BERLIN 33,GERMANY

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 1994年 / 12卷 / 06期

关键词：

D O I：

10.1116/1.587578

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

引用

页码：3936 / 3942

页数：7

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